Parameters for the beamline
Total
horizontal
Energy Crystal Spot size angular
range type Resolution Flux focused acceptance
(KeV) (DE/E) (photons/sec) (mm2) (mradians)
5-21 Si(111/311) 2E-4 6E11 0.3 x 0.3 2
@10KeV 1% variation
(250mA, 2.5 GeV) in intensity
Optical Configuration.
- Mirror No. 1
Spherical rhodium coated silicon carbide
mirror; for vertical focusing; glazing angle of 3 mradians; located 5 meters
from the source.
- Monochromator
Double flat crystal monochromator in ultra
high vacuum; first crystal is water cooled; crystal movement in two ranges
from 8.5 - 15 deg. and from 13.5 - 70 deg. Bragg angle; piezoelectric
adjustment of second crystal; located 8.5 meters from source.
- Mirror No. 2
Cylindrical aluminium mirror with nickel
plating
coated by rhodium; mirror bender for horizontal focusing of 2 mradians;
grazing angle of 3 mradians; optics designed to give a beam intensity of
1% homogeneity over an area of 0.3 x 0.3 mm2 at 22 meters from source;
located 13 meters from the source.
Experimental Apparatus.
Radiation hutch; four circle Huber
diffractometer with crystal analyzer; xyz lift table with 500 - 800 lbs.
capacity; DISPLEX two stage refrigirator (10 - 400K);
heaters and controllers for temperatures up to 900C; SRS rare gas analyzer, scintillation and
ionization detectors; Mar345 image plate system.
Computer System; Hardware and Software
DEC 3000 alpha workstation; OpenVMS 6.1 operating system. 2.5GB of
disk storage; 64 MB of memory;
printers; complete data
acquisition and analysis software written in FORTRAN. Silicon Graphics
with MAR345 control software,
FIT2D software, and
HKL Package
Last Updated
April 22, 2004